Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Journal article (2008)

Authors

C Biasotto Microelectronics
JA Diniz External organisation
AM Daltrini External organisation
SA Moshkalev External organisation
MJR Monteiro External organisation
Department
Microelectronics
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Published Date

2008

Language

Undefined/Unknown

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Department

Microelectronics