Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications
Journal Article
(2008)
Author(s)
C Biasotto (TU Delft - Microelectronics)
JA Diniz (External organisation)
AM Daltrini (External organisation)
SA Moshkalev (External organisation)
MJR Monteiro (External organisation)
Department
Microelectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:3e241fab-b2cb-4615-a22f-7e258e793dcd
More Info
expand_more
expand_more
Publication Year
2008
Department
Microelectronics
Issue number
21
Volume number
516
Pages (from-to)
7777-7782
No files available
Metadata only record. There are no files for this record.