Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Biasotto, C; Diniz, JA; Daltrini, AM; Moshkalev, SA; Monteiro, MJR

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Journal article (2008)

Authors

C Biasotto Microelectronics

JA Diniz External organisation

AM Daltrini External organisation

SA Moshkalev External organisation

MJR Monteiro External organisation

Department

Microelectronics

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Published Date

2008

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Department

Microelectronics

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