The role of the silyl radical in plasma deposition of microcrystalline silicon

Journal article (2004)

Authors

C Smit Electronic Components, Technology and Materials - EEMCS
R.A.C.M.M. van Swaaij Electronic Components, Technology and Materials - EEMCS
EAG Hamers External organisation
MCM van de Sanden External organisation
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2004

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials