The role of the silyl radical in plasma deposition of microcrystalline silicon
Journal Article
(2004)
Author(s)
C Smit (TU Delft - Electronic Components, Technology and Materials)
René A.C.M.M. van Swaaij (TU Delft - Electronic Components, Technology and Materials)
EAG Hamers (External organisation)
MCM van de Sanden (External organisation)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:4f4316b6-0c95-4113-87a5-4fd8c52b4628
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Publication Year
2004
Research Group
Electronic Components, Technology and Materials
Issue number
8
Volume number
96
Pages (from-to)
4076-4083
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