New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapour deposition

High-rate deposition of microcrystalline silicon with an expanding thermal plasma

The role of the silyl radical in plasma deposition of microcrystalline silicon

Material structure of microcrystalline silicon deposited with an expanding thermal plasma

Determining the material structure of microcrystalline silicon from Raman spectra

Fast deposition of microcrystalline silicon with an expanding thermal plasma

High-rate microcrystalline silicon for solar cells

Effect of buffer sayers on p-i-n- a-Si:H solar cells deposited at high rate utilising an expanding thermal plasma

Integration of expanding thermal plasma deposited hydrogenated amorphous silicon in solar cells

Importance of defect density near the p-i interface for a-Si:H solar cell performance

Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s

Fast deposition of microcrystalline silicon with an expanding thermal plasma

A compact 4-channel multi-wavelength ringlaser

A dual-phasar multi-wavelength ringlaser

Challenges in amorphous silicon solar cell technology

Solar cells with intrinsic a-Si: H deposited at rates larger than 5 Å/s by the expanding thermal plasma

Temperature dependence at various intrinsic a-Si:H growth rates of p-i-n deposited solar cells