High-rate deposition of microcrystalline silicon with an expanding thermal plasma
Journal Article
(2005)
Author(s)
C Smit (TU Delft - Electronic Components, Technology and Materials)
A Klaver (TU Delft - Electronic Components, Technology and Materials)
BA Korevaar (TU Delft - Electronic Components, Technology and Materials)
AMHN Petit (TU Delft - Electronic Components, Technology and Materials)
DL Williamson (External organisation)
RACMM Swaaij (TU Delft - Electronic Components, Technology and Materials)
MCM van de Sanden (External organisation)
Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1016/j.tsf.2005.06.032
To reference this document use:
https://resolver.tudelft.nl/uuid:8a615984-faba-426a-966a-92f57d185c45
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Publication Year
2005
Research Group
Electronic Components, Technology and Materials
Issue number
1-2
Volume number
491
Pages (from-to)
280-293
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