Preparation of large, location-controlled Si grains by excimer laser crystallization of ¿-Si film sputtered at 100 °C

M He (TU Delft - Electronic Components, Technology and Materials)

EJJ Neihof (TU Delft - Electronic Components, Technology and Materials)

Y van Andel (TU Delft - Electronic Components, Technology and Materials)

H Schellevis (TU Delft - Electronic Components, Technology and Materials)

R Ishihara (TU Delft - Electronic Components, Technology and Materials)

JW Metselaar (TU Delft - Electronic Components, Technology and Materials)

C.I.M. Beenakker (TU Delft - Electronic Components, Technology and Materials)