Resist thickness effects on ultra thin HSQ patterning capabilities
Journal Article
(2009)
Author(s)
VA Sidorkin (TU Delft - QN/Kavli Nanolab Delft)
AE Grigorescu (TU Delft - ImPhys/Charged Particle Optics)
Huub Salemink (TU Delft - QN/Photronic Devices)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:5ba44618-8e6b-4e78-895f-c7624aa17bfb
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Publication Year
2009
Research Group
QN/Kavli Nanolab Delft
Issue number
4-6
Volume number
86
Pages (from-to)
749-751
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