Electromigration and diffusion in short Al-Ni-Cr lines
Conference Paper
(1998)
Author(s)
LC Jacobs (External organisation)
A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:5e3a9249-fe29-4011-ac51-cfec5bf31265
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Publication Year
1998
Research Group
QN/Fysics of NanoElectronics
Pages (from-to)
275-280
ISBN (print)
155899422X
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