Reverse Recovery Optimization of Multiepi Superjunction MOSFET Based on Tunable Doping Profile
Ke Liu (Southern University of Science and Technology )
C. Tan (TU Delft - Electronic Components, Technology and Materials, Southern University of Science and Technology )
Shizhen Li (Southern University of Science and Technology )
Wucheng Yuan (Southern University of Science and Technology )
X. Liu (Southern University of Science and Technology , TU Delft - Electronic Components, Technology and Materials)
G. Zhang (TU Delft - Electronic Components, Technology and Materials)
P.J. French (TU Delft - Bio-Electronics)
H. Ye (Southern University of Science and Technology , TU Delft - Electronic Components, Technology and Materials)
S. Wang (Southern University of Science and Technology , TU Delft - Bio-Electronics)
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Abstract
This paper proposes and simulates research on the reverse recovery characteristics of two novel superjunction (SJ) MOSFETs by adjusting the doping profile. In the manufacturing process of the SJ MOSFET using multilayer epitaxial deposition (MED), the position and concentration of each Boron bubble can be adjusted by designing different doping profiles to adjust the resistance of the upper half P-pillar. A higher P-pillar resistance can slow down the sweep out speed of hole carriers when the body diode is turned off, thus resulting in a smoother reverse recovery current and reducing the current recovery rate (d (Formula presented.) /d (Formula presented.)) from a peak to zero. The simulation results show that the reverse recovery peak current (I (Formula presented.)) of the two proposed devices decreased by 5% and 3%, respectively, compared to the conventional SJ. Additionally, the softness factor (S) increased by 64% and 55%, respectively. Furthermore, this study also demonstrates a trade-off relationship between static and reverse recovery characteristics with the adjustable doping profile, thus providing a guideline for actual application scenarios.
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