Interfaces between crystalline Si and amorphous B: Interfacial interactions and charge barriers

Journal Article (2021)
Author(s)

Piet Xiaowen Fang (Radboud Universiteit Nijmegen)

Stoyan Nihtianova (TU Delft - Electronic Instrumentation)

P. M. Sberna (TU Delft - EKL Processing)

Changming Fang (Brunel University London)

Research Group
Electronic Instrumentation
DOI related publication
https://doi.org/10.1103/PhysRevB.103.075301
More Info
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Publication Year
2021
Language
English
Research Group
Electronic Instrumentation
Issue number
7
Volume number
103

Abstract

The recently found crystalline silicon-amorphous boron (c-Si/a-B) heterojunction has been successfully applied in the detection of short-wave UV photons. These detectors play a decisive role in the progress of nanoelectronics fabrication. The c-Si/a-B heterojunction could not be explained using the existing 'instrumentarium' in semiconductor physics. We investigated the c-Si/a-B interfaces using ab initio molecular dynamics simulations. The simulations reveal atomic ordering of the a-B atoms adjacent to both the Si{0 0 1} and Si{1 1 1} substrates. Charge transfer occurs from the interfacial Si to B, thereby forming Si+/B- charge barriers, which induce an electric field in the nearby regions. The obtained information here is helpful in furthering our understanding of the physics behind the c-Si/a-B junctions, as well as driving the development of a new 'instrumentatrium' in solid state physics.

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