Helium implantation in silicon: the effects of implantation temperature
Journal Article
(2003)
Author(s)
E Oliviero (External organisation)
ML David (External organisation)
AV Fedorov (TU Delft - Old - Section Defects in Materials)
A van Veen (TU Delft - Old - Section Defects in Materials)
MF Beaufort (External organisation)
JF Barbot (External organisation)
Research Group
Old - Section Defects in Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:7c31fb55-f2d9-42c1-8516-88890eda4049
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Publication Year
2003
Research Group
Old - Section Defects in Materials
Volume number
102
Pages (from-to)
222-227
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