Location-control of large Si grains by dual-beam excimer-laser and thick oxide portion
Journal Article
(2000)
Author(s)
Ryoichi Ishihara (TU Delft - Electronic Components, Technology and Materials)
A Burtsev (External organisation)
Paul F.A. Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:8270b3d0-49f1-4695-8bfe-1a2ddf6f08f5
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Publication Year
2000
Research Group
Electronic Components, Technology and Materials
Issue number
7
Volume number
39
Pages (from-to)
3872-3878
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