SiOFx and SiO2 deposition in an ECR-HDP reactor: Tool characterisation and film analysis
Journal Article
(1997)
Author(s)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
DJ de Boer (External organisation)
H Fukuda (External organisation)
JBC van de Hilst (External organisation)
Guido Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:844962f4-0648-40e4-b260-8c1047a5d74b
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Publication Year
1997
Research Group
QN/Fysics of NanoElectronics
Volume number
38
Pages (from-to)
271-276
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