6 records found
1
Characteizatin of deposition rate and gap filling capability of a high density plasma deposition reactor
Trenchfill with SiOF, uniformity of properties of interest over the wafer
SiOFx and SiO2 deposition in an ECR-HDP reactor: Tool characterisation and film analysis
Stress in AlNiCr films and stacks of films
Trenchfill with SiOF, electrical results
Baseline of the High Density Plasma Deposition tool asessed in SiO2 deposition