Deposition of sacrificial silicon oxide layers by electron cyclotron resonance plasma
Journal Article
(2007)
Author(s)
C Biasotto (TU Delft - Microelectronics)
AM Daltrini (External organisation)
RC Teixeira (External organisation)
FA Boscoli (External organisation)
JA Diniz (External organisation)
SA Moshkalev (External organisation)
I Doi (External organisation)
Department
Microelectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:8d818b3e-5354-4dc2-b2c5-b6e41235b6a9
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Publication Year
2007
Department
Microelectronics
Issue number
4
Volume number
25
Pages (from-to)
1166-1170
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