A review on in situ stiffness adjustment methods in MEMS
M.L.C. de Laat (TU Delft - Science Education and Communication)
H.H. Perez Garza (DENSsolutions)
JL Herder (TU Delft - Mechatronic Systems Design)
Murali K. Krishna Ghatkesar (TU Delft - Micro and Nano Engineering)
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Abstract
In situ stiffness adjustment in microelectromechanical systems is used in a variety of applications such as radio-frequency mechanical filters, energy harvesters, atomic force microscopy, vibration detection sensors. In this review we provide designers with an overview of existing stiffness adjustment methods, their working principle, and possible adjustment range. The concepts are categorized according to their physical working principle. It is concluded that the electrostatic adjustment principle is the most applied method, and narrow to wide ranges in stiffness can be achieved. But in order to obtain a wide range in stiffness change, large, complex devices were designed. Mechanical stiffness adjustment is found to be a space-effective way of obtaining wide changes in stiffness, but these methods are often discrete and require large tuning voltages. Stiffness adjustment through stressing effects or change in Young's modulus was used only for narrow ranges. The change in second moment of inertia was used for stiffness adjustment in the intermediate range.
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