Sub-10-nm nanolithography with a scanning helium beam

Sidorkin, VA; Veldhoven, E van; van der Drift, E.W.J.M.; Alkemade, Paul; Salemink, H.W.M.; Maas, D

Sub-10-nm nanolithography with a scanning helium beam

Journal article (2009)

Authors

VA Sidorkin QN/Kavli Nanolab Delft

E van Veldhoven External organisation

E.W.J.M. van der Drift QN/Kavli Nanolab Delft

Paul Alkemade QN/Kavli Nanolab Delft, QN/Fysics of NanoElectronics

H.W.M. Salemink QN/Photronic Devices

D Maas External organisation

Research Group

QN/Kavli Nanolab Delft

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Published Date

2009

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Research Group

QN/Kavli Nanolab Delft

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