Depth profile analysis of Si with low-energy and oblique O2+ beams.
Conference Paper
(1999)
Author(s)
ZX Jiang (External organisation)
Paul Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))
JLF Wang (External organisation)
Research Group
Old - sect Electronic Materials (NS/EM)
To reference this document use:
https://resolver.tudelft.nl/uuid:9ec216cf-672c-4512-b9ab-f386439f7f18
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Publication Year
1999
Research Group
Old - sect Electronic Materials (NS/EM)
Pages (from-to)
6-8
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