1.9 nm Wide Ultra-High Aspect-Ratio Bulk-Si FinFETs
Conference Paper
(2009)
Author(s)
V Jovanovic (TU Delft - Electronic Components, Technology and Materials)
M Poljak (External organisation)
T Suligoj (External organisation)
Y Civale (TU Delft - Electronic Components, Technology and Materials)
L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:a310ce99-1320-4b04-8d44-b0883ad90106
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Publication Year
2009
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
261-262
ISBN (print)
978-1-4244-3528-9
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