A study of the CMP effect on the quality of thin silicon films crystallized by using the ¿-Czochralski process
Journal Article
(2009)
Authors
J Derakhshandeh (External organisation)
M.R. Tajari Mofrad (TU Delft - Electronic Components, Technology and Materials)
R Ishihara (TU Delft - Electronic Components, Technology and Materials)
J. van der Cingel (TU Delft - Electronic Components, Technology and Materials)
C.I.M. Beenakker (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/b5a4b2a3-327a-45ba-bcb1-ad1b12221c5f
More Info
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Publication Year
2009
Research Group
Electronic Components, Technology and Materials
Issue number
1
Volume number
54
Pages (from-to)
432-436
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