Dry etching of SiC in inductively coupled Cl-2/Ar plasma
Journal Article
(2004)
Author(s)
LD Jiang (External organisation)
NOV Plank (External organisation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
R Cheung (External organisation)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:b6e44491-7187-4141-aef3-ff2eb0087a8b
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Publication Year
2004
Research Group
QN/Kavli Nanolab Delft
Issue number
13
Volume number
37
Pages (from-to)
1809-1814
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