Process technology of high-aspect-ratio silicon beams for stretchable silicon electronics

Zoumpoulidis, T.; Tian, J.; Sosin, S; Bartek, M.; Wang, L; Jansen, Kaspar M.B.; Ernst, L.J.; Dekker, Ronald; de Graaf, P.

Process technology of high-aspect-ratio silicon beams for stretchable silicon electronics

Conference paper (2008)

Authors

T. Zoumpoulidis Old - EWI Sect. ECTM

J. Tian Old - EWI Sect. ECTM

S Sosin Old - EWI Sect. ECTM

M. Bartek Old - EWI Sect. ECTM

L Wang Electronic Components, Technology and Materials

Kaspar M.B. Jansen Computational Design and Mechanics

L.J. Ernst Computational Design and Mechanics

Ronald Dekker Electronic Components, Technology and Materials

P. de Graaf External organisation

Research Group

Old - EWI Sect. ECTM

Elektrotechniek Techniek

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Published Date

2008

Language

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Research Group

Old - EWI Sect. ECTM

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