Sub-gap defect density characterization of molybdenum oxide

An annealing study for solar cell applications

Journal Article (2020)
Author(s)

D. Scire (Università degli Studi di Palermo, TU Delft - Photovoltaic Materials and Devices)

P.A. Prócel (TU Delft - Photovoltaic Materials and Devices)

Antonino Gulino (University of Catania)

O Isabella (TU Delft - Photovoltaic Materials and Devices)

M. Zeman (TU Delft - Electrical Sustainable Energy)

Isodiana Crupi (Università degli Studi di Palermo)

Research Group
Photovoltaic Materials and Devices
Copyright
© 2020 D. Scire, P.A. Procel Moya, Antonino Gulino, O. Isabella, M. Zeman, Isodiana Crupi
DOI related publication
https://doi.org/10.1007/s12274-020-3029-9
More Info
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Publication Year
2020
Language
English
Copyright
© 2020 D. Scire, P.A. Procel Moya, Antonino Gulino, O. Isabella, M. Zeman, Isodiana Crupi
Related content
Research Group
Photovoltaic Materials and Devices
Issue number
12
Volume number
13
Pages (from-to)
3416-3424
Reuse Rights

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Abstract

The application of molybdenum oxide in the photovoltaic field is gaining traction as this material can be deployed in doping-free heterojunction solar cells in the role of hole selective contact. For modeling-based optimization of such contact, knowledge of the molybdenum oxide defect density of states (DOS) is crucial. In this paper, we report a method to extract the defect density through nondestructive optical measures, including the contribution given by small polaron optical transitions. The presence of defects related to oxygen-vacancy and of polaron is supported by the results of our opto-electrical characterizations along with the evaluation of previous observations. As part of the study, molybdenum oxide samples have been evaluated after post-deposition thermal treatments. Quantitative results are in agreement with the result of density functional theory showing the presence of a defect band fixed at 1.1 eV below the conduction band edge of the oxide. Moreover, the distribution of defects is affected by post-deposition treatment. [Figure not available: see fulltext.]