Optimum dose for shot noise limited CD uniformity in E-beam lithography
Journal Article
(2004)
Author(s)
Pieter Kruit (TU Delft - ImPhys/Charged Particle Optics)
S. Steenbrink (External organisation)
R. Jager (TU Delft - ImPhys/Charged Particle Optics)
MJJ Wieland (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:e6e05e4e-080c-415b-9fb1-beb9a563ff2a
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Publication Year
2004
Research Group
ImPhys/Charged Particle Optics
Issue number
6
Volume number
22
Pages (from-to)
2948-2955
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