Optimum dose for shot noise limited CD uniformity in E-beam lithography

Journal article (2004)

Authors

P. Kruit ImPhys/Charged Particle Optics
S. Steenbrink External organisation
R. Jager ImPhys/Charged Particle Optics
MJJ Wieland ImPhys/Charged Particle Optics
Research Group
ImPhys/Charged Particle Optics
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Published Date

2004

Language

Undefined/Unknown

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Research Group

ImPhys/Charged Particle Optics