Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist
Journal Article
(2009)
Author(s)
VA Sidorkin (TU Delft - QN/Kavli Nanolab Delft)
P.F.A. Alkemade (TU Delft - QN/Fysics of NanoElectronics, TU Delft - QN/Kavli Nanolab Delft)
H.W.M. Salemink (TU Delft - QN/Photronic Devices)
R. Schmits (External organisation)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
DOI related publication
https://doi.org/DOI:10.1116/1.3263171
To reference this document use:
https://resolver.tudelft.nl/uuid:ea7d0060-91dc-4f99-95e9-becf23abc022
More Info
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Publication Year
2009
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
B27
Pages (from-to)
2503-2507
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