Influence of externally applied bias and atomic hydrogen formation on the properties of nanocrystaline silicon deposited by expanding thermal plasma chemical vapor deposition
Conference Paper
(2007)
Author(s)
R Jimenez Zambrano (TU Delft - Electronic Components, Technology and Materials)
R.A.C.M.M. van Swaaij (TU Delft - Electronic Components, Technology and Materials)
MCM van de Sanden (External organisation)
Miroslav Zeman (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:ee6939ef-52b9-4a74-9480-1274b4999095
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Publication Year
2007
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
521-524
ISBN (print)
978-90-73461-49-9
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