Influence of externally applied bias and atomic hydrogen formation on the properties of nanocrystaline silicon deposited by expanding thermal plasma chemical vapor deposition

Conference paper (2007)

Authors

R Jimenez Zambrano Electronic Components, Technology and Materials -

R.A.C.M.M. van Swaaij Electronic Components, Technology and Materials -

MCM van de Sanden External organisation

M. Zeman Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

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http://resolver.tudelft.nl/uuid:ee6939ef-52b9-4a74-9480-1274b4999095

Published Date

2007

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials