CV doping profiling of boron out-diffusion using an abrupt and highly doped arsenic buried epilayer
Conference Paper
(2002)
Author(s)
C Ortiz (TU Delft - Electronic Components, Technology and Materials)
L.K. Nanver (TU Delft - Electronic Components, Technology and Materials)
WD van Noort (TU Delft - Electronic Components, Technology and Materials)
TLM Scholtes (TU Delft - Electronic Components, Technology and Materials)
JW Slotboom (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:f754c512-be02-49a4-b5ac-7f645dbe8907
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Publication Year
2002
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
83-88
ISBN (print)
0-7803-7464-9
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