Print Email Facebook Twitter Measuring residual stresses in individual on-chip interconnects using synchrotron nanodiffraction Title Measuring residual stresses in individual on-chip interconnects using synchrotron nanodiffraction Author Zhang, Y. (TU Delft Electronic Components, Technology and Materials) Du, L. (TU Delft Electronic Components, Technology and Materials) Bäcke, Olof (Chalmers University of Technology) Kalbfleisch, Sebastian (MAX IV Laboratory) Zhang, Kouchi (TU Delft Electronic Components, Technology and Materials) Vollebregt, S. (TU Delft Electronic Components, Technology and Materials) Hörnqvist Colliander, Magnus (Chalmers University of Technology) Date 2024 Abstract As the dimensions of interconnects in integrated circuits continue to shrink, an urgent need arises to understand the physical mechanism associated with electromigration. Using x-ray nanodiffraction, we analyzed the stresses in Blech-structured pure Cu lines subjected to different electromigration conditions. The results suggest that the measured residual stresses in the early stages of electromigration are related to relaxation of stresses caused by thermal expansion mismatch, while a developing current-induced stress leads to reductions in the residual stress after longer test times. These findings not only validate the feasibility of measuring stress in copper lines using nanodiffraction but also highlight the need for a further understanding, particularly through in situ electromigration experiments with x-ray nanodiffraction analysis. To reference this document use: http://resolver.tudelft.nl/uuid:d38dab00-d96b-4657-8beb-ebb446649e68 DOI https://doi.org/10.1063/5.0192672 ISSN 0003-6951 Source Applied Physics Letters, 124 (8) Part of collection Institutional Repository Document type journal article Rights © 2024 Y. Zhang, L. Du, Olof Bäcke, Sebastian Kalbfleisch, Kouchi Zhang, S. Vollebregt, Magnus Hörnqvist Colliander Files PDF 083501_1_5.0192672.pdf 1.5 MB Close viewer /islandora/object/uuid:d38dab00-d96b-4657-8beb-ebb446649e68/datastream/OBJ/view