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Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution
Solid-phase crystallization of ultra high growth rate amorphous silicon films
Effect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces
Hydrogenated amorphous silicon deposited under accurately controlled ion bombardment using pulse-shaped substrate biasing
Optical constants of graphene measured by spectroscopic ellipsometry
On the formation mechanisms of the diffuse atmospheric pressure dielectric barrier discharge in CVD processes of thin silica-like films
On the surface roughness development of hydrogenated amorphous silicon deposited at low growth rates
Influence of rarefaction on the flow dynamics of a stationary supersonic hot-gas expansion
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