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Kinetics of tungsten low-pressure chemical-vapor deposition using WF
6 and SiH
4 studied by in situ growth-rate measurements
Kinetics and mechanism of tungsten LPCVD using tungsten hexafluoride and silane studied by in-situ growth rate measurements
Chemical vapour deposition of tungsten by H2 reduction of WCl6. Fourth European workshop on refractory metals and silicides: Selected papers, Saltsjobaden, Sweden, March 24-27, 1991