Tailoring the Mechanical Properties of High-Aspect-Ratio Carbon Nanotube Arrays using Amorphous Silicon Carbide Coatings

The porous nature of carbon nanotube (CNT) arrays allows for the unique opportunity to tailor their mechanical response by the infiltration and deposition of nanoscale conformal coatings. Here, we fabricate novel photo-lithographically defined CNT pillars that are conformally coated with amorphous silicon carbide (a-SiC) to strengthen the...

Monitoring the restoration of interfacial contact for self healing thermal interface materials for LED and microelectronic applications

While conventional self healing materials focus on the restoration of mechanical properties, newer generations of self healing materials focus on the restoration of other functional (i.e. non-mechanical) properties. Thermal conductivity is an example of an important functional property of a Thermal Interface Material (TIM) for LED’s and...

Monitoring the restoration of interfacial contact for self healing thermal interface materials for LED and microelectronic applications

While conventional self healing materials focus on the restoration of mechanical properties, newer generations of self healing materials focus on the restoration of other functional (i.e. non-mechanical) properties. Thermal conductivity is an example of an important functional property of a Thermal Interface Material (TIM) for LED’s and...

Single-Mask Fabrication of Temperature Triggered MEMS Switch for Cooling Control in SSL System

A micro-electro-mechanical-system (MEMS) based, temperature triggered, switch is developed as a cost-effective solution for smart cooling control of solid-state-lighting systems. The switch (1.0x0.4 mm2) is embedded in a silicon substrate and fabricated with a single-mask 3D micro-machining process. The device switches on at a designed...

Self-healing approach for enhanced reliability of light emitting diodes (poster abstract)

From 2-Dimensional Lithography To 3-Dimensional Structures

Lithography for IC device fabrication is a high volume high accuracy production technology. Such production characteristics are also attractive for MEMS and 3 dimensional (3D) integration processes. However, advanced lithography has a strong 2 dimensional (2D) nature and is not optimized to fabricate 3D structures. In this work, 5 exposure and...

From 2D Lithography to 3D Patterning

Lithography as developed for IC device fabrication is a high volume high accuracy patterning technology with strong 2 dimensional (2D) characteristics. This 2D nature makes it a challenge to integrate this technology in a 3 dimensional (3D) manufacturing environment. This article addresses the performance of a waferstepper (ASML PAS5000) in...

From 2D Lithography to 3D Patterning

A dual-side fabrication method for silicon plate springs with high out-of-plane stiffness

3D Align overlay verification using glass wafers

In the MEMS world, increasing attention is being given to 3D devices requiring dual-sided processing. This requires lithography tools that are able to align a wafer to both its back side as front side. Overlay describes how well front and back side layers are positioned with respect to each other. Currently there is no simple and fast method to...

Characterization of waferstepper and process related front- to backwafer overlay errors in bulk micro machining using electrical overlay test structures

To validate the Front- To Backwafer Alignment (FTBA) calibration and to investigate process related overlay errors, electrical overlay test structures are used that requires FTBA [1]. Anisotropic KOH etch through the wafer is applied to transfer the backwafer pattern to the frontwafer. Consequently, the crystal orientation introduces an overlay...

Modelling and fabrication of Geiger mode avalanche photodiodes