Bandgap energy profiling is applied in a variety of materials for photovoltaic technologies, such as chalcogenides, III–V materials and perovskites. Bandgap profiling of the absorber layer is used to fight the fundamental loss mechanisms imposed by the bandgap energy of the absorber for the maximum voltage and current that a photovoltaic device can generate. The bandgap profile can be affected by a number of profiling strategies, such as the difference between the maximum and minimum bandgap energy, the position of the minimum bandgap energy, the width over which this minimum bandgap energy occurs and the total absorber width. These parameters have a complex effect on output characteristics of a photovoltaic device. Varying multiple parameters at once further increases the complexity, limiting the effectiveness of rigorous physical opto-electrical modelling. In this work we therefore present an expedient semi-empirical approach for the optimal bandgap profiling of stoichiometric absorbers. Using PECVD processed amorphous silicon germanium as a model, we present a unique set of semi-empirical relations that simulate the VOC and JSC of solar cells as a function of the bandgap energy profile. For this model, the influence of deposition conditions such as the relative germane flow rate, the deposition power and substrate temperature on the opto-electrical properties of a-SiGe:H films is first characterized. Opting for the relative germane flow rate to control the bandgap profiling, the experimental results of a large number of solar cells with profiled a-SiGe:H absorber are presented, varying: 1. the absorber thickness, 2. the peak germane flow rate, so minimum bandgap energy, and 3. the introduction of a plateau at the minimum bandgap energy. Using this experimental data and optical simulations, the expedience and effectiveness of the semi-empirical approach is demonstrated.@en

Two terminal multi-junction (MJ) photovoltaic (PV) devices are well established concepts to increase the solar-to-electrical power conversion in reference to single PV junctions. In multi-junction PV devices two consecutive sub-cells are interconnected using a tunnel recombination junction (TRJ) in which the light excited holes of one sub-cell recombine with the light excited electrons of the other sub cell. An ideal TRJ is an ohmic contact with non-rectifying behaviour. TRJ's based on p- and n-doped silicon-oxides have been successfully applied in a variety of hybrid multi-junction PV devices in which tunnelling and trap-assisted tunnelling over width of 5–20 nm rules the TRJ's recombination kinetics. In this contribution the qualitative fundamental working principles of tunnel recombination junctions based on p- and n-doped silicon and silicon-oxide alloys are revealed using both electrical modelling and experiments based on a unique set of tandem lab cells (four types based on four different PV materials) combined with structural variations in TRJ architectures. The study results in design rules for the integration of silicon-oxide based TRJ's and provides fundamental insights into the sensitivity of the electrical performance of the TRJ's to doping concentrations, to alignment of the conduction and valence bands of consecutive sub-cells, to the nature of interface defects, to the growth of amorphous and crystalline phases and its dependence on substrate or seed layers and to the nanoscale thicknesses of the TRJ layers.@en