We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography, using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium p
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We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography, using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films-measured both by hydrogenography and by Sievert's method-we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials.
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