In this paper the opto-electrical nature of hydrogenated group IV alloys with optical bandgap energies ranging from 1.0 eV up to 2.3 eV are studied. The fundamental physical principles that determine the relation between the bandgap and the structural characteristics such as material density, elemental composition, void fraction and crystalline phase fraction are revealed. Next, the fundamental physical principles that determine the relation between the bandgap and electrical properties such as the dark conductivity, activation energy, and photoresponse are discussed. The unique wide range of IV valence alloys helps to understand the nature of amorphous (a-) and nanocrystalline (nc-) hydrogenated (:H) germanium films with respect to the intrinsicity, chemical stability, and photoresponse. These insights resulted in the discovery of i) a processing window that results in chemically stable Ge:H films with the lowest reported dark conductivity values down to 4.6·10^-4 (Ω ·cm)^-1 for chemical vapor deposited Ge:H films, and ii) O, C and Sn alloying approaches to improve the photoresponse and chemical stability of the a/nc-Ge:H alloys.

Bandgap energy profiling is applied in a variety of materials for photovoltaic technologies, such as chalcogenides, III–V materials and perovskites. Bandgap profiling of the absorber layer is used to fight the fundamental loss mechanisms imposed by the bandgap energy of the absorber for the maximum voltage and current that a photovoltaic device can generate. The bandgap profile can be affected by a number of profiling strategies, such as the difference between the maximum and minimum bandgap energy, the position of the minimum bandgap energy, the width over which this minimum bandgap energy occurs and the total absorber width. These parameters have a complex effect on output characteristics of a photovoltaic device. Varying multiple parameters at once further increases the complexity, limiting the effectiveness of rigorous physical opto-electrical modelling. In this work we therefore present an expedient semi-empirical approach for the optimal bandgap profiling of stoichiometric absorbers. Using PECVD processed amorphous silicon germanium as a model, we present a unique set of semi-empirical relations that simulate the V_OC and J_SC of solar cells as a function of the bandgap energy profile. For this model, the influence of deposition conditions such as the relative germane flow rate, the deposition power and substrate temperature on the opto-electrical properties of a-SiGe:H films is first characterized. Opting for the relative germane flow rate to control the bandgap profiling, the experimental results of a large number of solar cells with profiled a-SiGe:H absorber are presented, varying: 1. the absorber thickness, 2. the peak germane flow rate, so minimum bandgap energy, and 3. the introduction of a plateau at the minimum bandgap energy. Using this experimental data and optical simulations, the expedience and effectiveness of the semi-empirical approach is demonstrated.

Crystalline silicon tandem devices with perovskites, CIGS, and nanocrystalline silicon, as well as the TOPCon design, are incompatible with the conventional pyramidal surface texture of silicon. This is a result of crack formation in nano to polycrystalline growth on large sharp surface features. In this work, three texturing approaches are investigated, using alkaline and/or acidic wet chemical etches, that can lead to the crack-free growth of nano to polycrystalline materials on textured surfaces. In this work, we show that without acidic smoothening, the fraction of <111> pyramidal surface coverage has to remain relatively small to prevent crack formation during crystalline growth on these surfaces. Applying an acidic etch as a function of time continuously smoothens surface features. This shifts the reflection to wider scattering angles and results in higher total reflected intensity with respect to the conventional texture, making it an interesting option for a wide variety of tandem pv applications. Finally, we demonstrate crater-like features on a <100> monocrystalline silicon surface using an etching process including a sacrificial layer. These craters increase light scattering into wider angles, but to a lesser extent than the former approach. In terms of passivation, we demonstrate the positive effect of a post deposition hydrogen treatment. Initial dilution of the silane plasma improves passivation on a <111> surface, but is detrimental to passivation on a <100> surface, likely because the hydrogen dilution results in epitaxial growth at the c-Si/a-Si:H hetero-interface. A minority carrier lifetime of over 3 ms has been achieved for all texturing approaches, after deposition of a 15 nm a-Si:H layer on both sides of the wafer, for different a-Si:H deposition and annealing schemes.