Reducing indium consumption in transparent conductive oxide (TCO) layers is crucial for mass production of silicon heterojunction (SHJ) solar cells. In this contribution, optical simulation-assisted design and optimization of SHJ solar cells featuring MoO_x hole collectors with ultra-thin TCO layers is performed. Firstly, bifacial SHJ solar cells with MoO_x as the hole transport layer (HTL) and three types of n-contact as electron transport layer (ETL) are fabricated with 50 nm thick ITO on both sides. It is found that bilayer (nc-Si:H/a-Si:H) and trilayer (nc-SiO_x:H/nc-Si:H/a-Si:H) as n-contacts performed electronically and optically better than monolayer (a-Si:H) in bifacial SHJ cells, respectively. Then, as suggested by optical simulations, the same stack of tungsten-doped indium oxide (IWO) and optimized MgF₂ layers are applied on both sides of front/back-contacted SHJ solar cells. Devices endowed with 10 nm thick IWO and bilayer n-contact exhibit a certified efficiency of 21.66% and 20.66% when measured from MoO_x and n-contact side, respectively. Specifically, when illuminating from the MoO_x side, the short-circuit current density and the fill factor remain well above 40 mA cm⁻² and 77%, respectively. Compared to standard front/rear TCO thicknesses (75 nm/150 nm) deployed in monofacial SHJ solar cells, this represents over 90% TCO reduction. As for bifacial cells featuring 50 nm thick IWO layers, a champion device with a bilayer n-contact as ETL is obtained, which exhibits certified conversion efficiency of 23.25% and 22.75% when characterized from the MoO_x side and the n-layer side, respectively, with a bifaciality factor of 0.98. In general, by utilizing a n-type bilayer stack, bifaciality factor is above 0.96 and it can be further enhanced up to 0.99 by switching to a n-type trilayer stack. Again, compared to the aforementioned standard front/rear TCO thicknesses, this translates to a TCO reduction of more than 67%.

Silicon heterojunction (SHJ) solar cells have achieved a record efficiency of 26.81% in a front/back-contacted (FBC) configuration. Moreover, thanks to their advantageous high V_OC and good infrared response, SHJ solar cells can be further combined with wide bandgap perovskite cells forming tandem devices to enable efficiencies well above 33%. In this study, we present strategies to realize high-efficiency SHJ solar cells through combined theoretical and experimental studies, starting from the optimization of Si-based thin-film layers to the implementation of electrodes with reduced indium and silver usage. Advanced opto-electrical simulations, which enable comprehensive theoretical understandings of the main physical mechanisms governing carriers’ collection and light management, provide clear pathways for device designs and experimental optimizations. We present the fabricated FBC-SHJ solar cells in both monofacial and bifacial configurations with the best efficiencies of 24.18% and 23.25%, respectively. We point out that to achieve optimum device performance, the compositional materials should be holistically optimized and evaluated as part of the contact stacks with adjacent layers. As an outlook beyond the classical FBC-SHJ solar cell architecture, we propose various novel SHJ-based solar cell architectures. Their potential performance was assessed and compared via rigorous opto-electrical simulations and a maximal efficiency of 27.60% was simulated for FBC-SHJ solar cells featuring localized contacts.

Monolithic perovskite/c-Si tandem solar cells have attracted enormous research attention and have achieved efficiencies above 30%. This work describes the development of monolithic tandem solar cells based on silicon heterojunction (SHJ) bottom- and perovskite top-cells and highlights light management techniques assisted by optical simulation. We first engineered (i)a-Si:H passivating layers for (100)-oriented flat c-Si surfaces and combined them with various (n)a-Si:H, (n)nc-Si:H, and (n)nc-SiOx:H interfacial layers for SHJ bottom-cells. In a symmetrical configuration, a long minority carrier lifetime of 16.9 ms was achieved when combining (i)a-Si:H bilayers with (n)nc-Si:H (extracted at the minority carrier density of 1015 cm-3). The perovskite sub-cell uses a photostable mixed-halide composition and surface passivation strategies to minimize energetic losses at charge-transport interfaces. This allows tandem efficiencies above 23% (a maximum of 24.6%) to be achieved using all three types of (n)-layers. Observations from experimentally prepared devices and optical simulations indicate that both (n)nc-SiOx:H and (n)nc-Si:H are promising for use in high-efficiency tandem solar cells. This is possible due to minimized reflection at the interfaces between the perovskite and SHJ sub-cells by optimized interference effects, demonstrating the applicability of such light management techniques to various tandem structures.

Passivating contacts based on poly-Si have enabled record-high c-Si solar cell efficiencies due to their excellent surface passivation quality and carrier selectivity. The eventual existence of pinholes within the ultra-thin SiOx layer is one of the key factors for carrier collection, beside the tunneling mechanism. However, pinholes are usually believed to have negative impact on the passivation quality of poly-Si passivating contacts. This work studied the influence of the pinhole density on the passivation quality of ion-implanted poly-Si passivating contacts by decoupling the pinhole generation from the dopants diffusion process by means of two annealing steps: (1) a pre-annealing step at high temperature after the intrinsic poly-Si deposition to visualize the formation of pinholes and (2) a post-annealing step for dopants activation/diffusion after ion-implantation. The pinhole density is quantified in the range of 1✕106 to 3✕108 cm2 by the TMAH selective etching approach. The passivation quality is discussed with respect to the pinhole density and the post-annealing thermal budget (TB) for dopants diffusion. The study shows that a moderate pinhole density does not induce doping profile variations that can be detectable by the coarse spatial resolution of ECV measurements. It is surprising that the existence of pinholes in a moderate density within our thickness fixed SiOx layer can effectively enhance the passivation qualities for both n+ and p+ poly-Si passivating contacts. We speculate the reason is due to the enhanced field-effect passivation at the pinhole surrounding. In fact, the variation of the passivation quality depends on the balance between a strengthened field-effect passivation and an excessive local Auger recombination, being both effects induced by the higher and deeper level of dopants diffused into the c-Si surface through the pinholes.

Passivating contacts are crucial for realizing high-performance crystalline silicon solar cells. Herein, contact formation by plasma-enhanced chemical vapor deposition (PECVD) followed by an annealing step is focused on. Poly-SiO_x passivating contacts by combining plasma-assisted N₂O-based oxidation of silicon (PANO-SiO_x) with a thin film of phosphorus (n⁺) or boron (p⁺)-doped hydrogenated amorphous silicon oxide (a-SiO_x:H) are manufactured. Postannealing is conducted for transitioning a-SiO_x:H into poly-SiO_x. The aim is to achieve a contact with low absorption and high-quality passivation. It is demonstrated that by tuning the plasma oxidation process time and power, the PANO-SiO_x thickness and its passivation quality can be controlled. A higher SiO₂ content is observed in PANO-SiO_x than in the nitric acid oxidation of silicon (NAOS-SiO_x) counterpart. PANO-SiO_x acts as a stronger diffusion barrier for both boron and phosphorus atoms compared to NAOS-SiO_x, affecting the dopant distribution during annealing. Implied open-circuit voltages up to 751 and 710 mV for n⁺ and p⁺ flat symmetric samples, respectively, are demonstrated. With respect to standard thermally grown SiO₂ tunneling oxide combined with (in/ex)situ-doped low-pressure chemical vapor deposition poly-Si, this study presents a simple alternative for manufacturing passivating contact fully based on PECVD processes.

Silicon heterojunction (SHJ) solar cells have reached high power conversion efficiency owing to their effective passivating contact structures. Improvements in the optoelectronic properties of these contacts can enable higher device efficiency, thus further consolidating the commercial potential of SHJ technology. Here we increase the efficiency of back junction SHJ solar cells with improved back contacts consisting of p-type doped nanocrystalline silicon and a transparent conductive oxide with a low sheet resistance. The electrical properties of the hole-selective contact are analysed and compared with a p-type doped amorphous silicon contact. We demonstrate improvement in the charge carrier transport and a low contact resistivity (<5 mΩ cm²). Eventually, we report a series of certified power conversion efficiencies of up to 26.81% and fill factors up to 86.59% on industry-grade silicon wafers (274 cm², M6 size).

In this chapter, we have reviewed candidates for further enhancement of cell efficiencies beyond those of today's mainstream PERC cells, with a focus on technological aspects rather than, e.g. cost. Regarding silicon single junctions, the prevalent theme is the use of carrier-selective passivating contacts, CSPCs. Of these, silicon heterojunction and polysilicon-on-silicon oxide (TOPCon/POLO) are most advanced and have enabled record high efficiencies above and close to 26%, respectively, on n-type silicon wafers. Further important topics are bifacial cell designs, which can be applied to different PV technologies. Single-side efficiencies above 25% have been achieved on bifacial TOPCon and bifacial SHJ solar cells. With proven bankability, bifacial PV products can be expected to gain more momentum in future development. In contrast, contacts based on metal compounds have yielded remarkable results in the last decade, yet failing to clearly evidence a significant advantage compared to the ones based on silicon. Further research is needed to unravel the material combination that would enable the long-awaited ultimate passivating contact for Si solar cells.

The second major topic are tandem and multijunction cells. This is the technology to move beyond the ultimate efficiency barrier of 29.4% for silicon PV and indeed, efficiencies well above 29% have been demonstrated in the lab for Si-based tandems. We have reviewed the current state of the art in lead halide perovskite-silicon tandems as well as III-V/silicon tandems. The former have reached a record PCE of 32.5% in monolithically integrated 2-terminal tandems, while III-V/Si 2T tandems currently stand at 23.4%. However, in III-V-Si devices, the number of absorbers has already been increased further, to three: in triple junction III-V/III-V/Si cells, PCEs of 35.9% have been realized with both 2T and 4T architectures. With a substantially higher cost for the III-V technology as compared to perovskites, but still inferior long-term stability in perovskites, as well as challenges in upscaling for both technologies, it remains to be seen which one of these technologies will gain an advantage. It should be mentioned that an important difference between reported silicon single junction and tandem/multijunction record devices is the cell area: while the single junction Si record devices have "industrial-size" active areas of several tens of cm2 or even full wafers, record tandem cells are lab-scale 1-4 cm2. Thus, up-scaling of tandem cells will remain an important topic in the near future.

At any rate, it can be expected that the exponential growth of PV as well as the diversity of applications (utility, rooftop and BIPV, agri-PV, etc.) will create ample opportunity for the market entry of quite a few of the mentioned technologies, and even for entirely new concepts such as three-terminal tandems or, at the module level, integrated PV and storage systems.

Crystalline silicon solar cells with passivating contacts based on doped poly-Si exhibit high optical parasitic losses. Aiming at minimizing these losses, we developed the oxygen-alloyed poly-Si (poly-SiOx) as suitable material for passivating contacts. From passivation point of view, poly-SiOx layers show excellent passivation quality and carrier selectivity for both n-type (iVOC,flat = 740 mV, contact resistance ρc = 0.7 mΩ/cm2, iVOC,textured = 723 mV) and p-type (iVOC,flat = 709 mV, ρc = 0.5 mΩ/cm2). Optically, due to the incorporation of oxygen, the absorption coefficient of poly-SiOx becomes much lower than that of doped poly-Si at long wavelength. Both n-type and p-type poly-SiOx layers are concurrently deployed in front/back-contacted (FBC) solar cells with a front indium tin oxide (ITO) layer to facilitate the lateral transport of carriers and minimize cell's reflection. A high cell FF of 83.5% obtained in double-side flat FBC solar cell indicates an efficient carrier collection by these passivating contacts. An active-area cell efficiency of 21.0% featuring JSC,EQE = 39.7 mA/cm2 is obtained in front-side textured poly-SiOx FBC cell, with the potential of further improvement in both VOC and FF. The optical advantage of poly-SiOx over poly-Si as passivating contact is also observed with a 19.7% interdigitated back-contacted (IBC) solar cell endowed with poly-SiOx emitter and back surface field. Compared to the reference 23.0% IBC solar cell with poly-Si passivating contacts, the one based on poly-SiOx passivating contacts shows higher IQE at wavelengths above 1100 nm. This indicates that for both FBC and IBC cells, poly-SiOx passivating contacts hold potential in enhancing the cell JSC by maximizing the cell spectral response.

A logical next step for achieving a cost price reduction per Watt peak of photovoltaics (PV) is multijunction PV devices. In two-terminal multijunction PV devices, the photo-current generated in each subcell should be matched. Intermediate reflective layers (IRLs) are widely employed in multijunction devices to increase reflection at the interface between subcells to enhance current generation in the subcell(s) positioned before the IRL, in reference to the incident light. In this work, the results of over 65 multijunction devices are presented, in order to explore the effect of different current matching approaches. The influence of variations in absorber thickness as well as thickness variations of different IRLs based on silicon-oxide, various transparent conductive oxides (TCO), and metallic layers on all-silicon multijunction PV devices is studied. Specifically, hybrid, 2-terminal, monolithically integrated silicon heterojunction (SHJ) and thin film nanocrystalline silicon (nc-Si:H) and amorphous silicon (a-Si:H) tandem and triple junction devices are processed. Based on these experiments, certain design rules for optimal current matching operation in multijunction devices are formulated. Finally, taking these design rules into account, record all-silicon multijunction devices are processed. Conversion efficiencies close 15% and (Formula presented.) V are demonstrated for triple junction SHJ/nc-Si:H/a-Si:H devices. Such conversion efficiencies for a wireless, high-voltage wafer-based all-silicon 2-terminal multijunction PV device opens the way for efficient autonomous solar-to-fuel synthesis systems as well as other wireless innovative approaches in which the multijunction solar cell is used not only as a photovoltaic current-voltage generator, but also as an ion-exchange membrane, electrochemical catalysts, and/or optical transmittance filter.

Reducing indium consumption, which is related to the transparent conductive oxide (TCO) use, is a key challenge for scaling up silicon heterojunction (SHJ) solar cell technology to terawatt level. In this work, we developed bifacial SHJ solar cells with reduced TCO thickness. We present three types of In₂O₃-based TCOs, tin-, fluorine-, and tungsten-doped In₂O₃ (ITO, IFO, and IWO), whose thickness has been optimally minimized. These are promising TCOs, respectively, from post-transition metal doping, anionic doping, and transition metal doping and exhibit different opto-electrical properties. We performed optical simulations and electrical investigations with varied TCO thicknesses. The results indicate that (i) reducing TCO thickness could yield larger current in both monofacial and bifacial SHJ devices; (ii) our IWO and IFO are favorable for n-contact and p-contact, respectively; and (iii) our ITO could serve well for both n-contact and p-contact. Interestingly, for the p-contact, with the ITO thickness reducing from 75 nm to 25 nm, the average contact resistivity values show a decreasing trend from 390 mΩ cm² to 114 mΩ cm². With applying 25-nm-thick front IWO in n-contact, and 25-nm-thick rear ITO use in p-contact, we obtained front side efficiencies above 22% in bifacial SHJ solar cells. This represents a 67% TCO reduction with respect to a reference bifacial solar cell with 75-nm-thick TCO on both sides.

Excellent surface passivation induced by (i)a-Si:H is critical to achieve high-efficiency silicon heterojunction (SHJ) solar cells. This is key for conventional single-junction cell applications but also for bottom cell application in tandem devices. In this study, we investigated the effects of (i)a-Si:H deposition temperature on passivation quality and SHJ solar cell performance. At the lower end of temperatures ranging from 140°C to 200°C, it was observed with Fourier-transform infrared spectroscopy (FTIR) that (i)a-Si:H films are less dense, thus hindering their surface passivation capabilities. However, with additional hydrogen plasma treatments (HPTs), those (i)a-Si:H layers deposited at lower temperatures exhibited significant improvements and better passivation qualities than their counterparts deposited at higher temperatures. On the other hand, even though we observed the highest V_OCs for cells with (i)a-Si:H deposited at the lowest temperature (140°C), the related FFs are poorer as compared to their higher temperature counterparts. The optimum trade-off between V_OC and FF for the SHJ cells was found with temperatures ranging from 160°C to 180°C, which delivered independently certified efficiencies of 23.71%. With a further improved p-layer that enables a FF of 83.3%, an efficiency of 24.18% was achieved. Thus, our study reveals two critical requirements for optimizing the (i)a-Si:H layers in high-efficiency SHJ solar cells: (i) excellent surface passivation quality to reduce losses induced by interface recombination and simultaneously (ii) less-defective (i)a-Si:H bulk to not disrupt the charge carrier collections.

In the efficiency-driven photovoltaic (PV) industry, the market dominating crystalline silicon (c-Si) technology has been developing towards PV devices with carrier-selective passivating contacts (CSPCs). Especially, the silicon heterojunction (SHJ) solar cell, based on hydrogenated amorphous silicon (a-Si:H) contact stacks, and the poly-Si solar cell, based on ultrathin SiOx/poly-Si passivating contacts, pave the way for power conversion efficiencies above 26%, approaching the theoretical limit of the c-Si solar cell. In case of front/back-contacted (FBC) architectures, to minimize the optical parasitic absorption at the emitter and/or surface field side(s), thin doped silicon layers are normally applied, which exhibit high sheet resistance. Accordingly, transparent conductive oxide (TCO) layers are required to ensure sufficient lateral carrier transport towards the metal electrodes. However, problems still exist in contacting schemes for high-efficiency solar cell design towards future multi-terawatt production of PV modules, regarding the development of TCO layer with high carrier mobility (μ), its integration into specific device structures, and more importantly, the material availability. In this work, we present three types of TCO materials. They are tin-, fluorine- and tungsten-doped indium oxide layers, namely, ITO, IFO, and IWO. RF magnetron sputtering approach has been utilized to deposit the films. The TCOs are integrated into both low thermal-budget SHJ and high thermal-budget poly-Si solar cells. Further, to address the sustainability implication related to indiumconsumption, we propose a strategy of bifacial SHJ solar cell with reduced TCO use. Meanwhile, to reduce silver (Ag) consumption, as well as to reach good solar cell performance in our laboratory, we have developed a platformfor bifacial copper (Cu)-platingmetallization approach. Specific results are summarized as follows...

Thin films of transition metal oxides such as molybdenum oxide (MoO_x) are attractive for application in silicon heterojunction solar cells for their potential to yield large short-circuit current density. However, full control of electrical properties of thin MoO_x layers must be mastered to obtain an efficient hole collector. Here, we show that the key to control the MoO_x layer quality is the interface between the MoO_x and the hydrogenated intrinsic amorphous silicon passivation layer underneath. By means of ab initio modelling, we demonstrate a dipole at such interface and study its minimization in terms of work function variation to enable high performance hole transport. We apply this knowledge to experimentally tailor the oxygen content in MoO_x by plasma treatments (PTs). PTs act as a barrier to oxygen diffusion/reaction and result in optimal electrical properties of the MoO_x hole collector. With this approach, we can thin down the MoO_x thickness to 1.7 nm and demonstrate short-circuit current density well above 40 mA/cm² and a champion device exhibiting 23.83% conversion efficiency.

Bifacial (BF) copper-plated crystalline silicon solar cell is an attractive topic to concurrently reduce silver consumption and maintain good device performance. However, it is still challenging to realize a high aspect ratio (AR) of the metal fingers. Herein, a new type of hybrid-shaped Cu finger is electromagnetically fabricated in a BF plating process. Cyclic voltammetry is employed to disclose the electrochemical behaviors of cupric ions in monofacial and simultaneous BF Cu-plating processes, such that the controllability of the plating process could be assessed. The optimal hybrid Cu finger is composed of a rectangular bottom part and a round top part, such that an utmost effective AR value of 1.73 is reached. In BF Cu-plating, two sub-three-electrode electrochemical cells are employed to realize equal metal finger heights on both sides of the wafer. Compared to our low thermal-budget screen-printing metallization, the Cu-plated silicon heterojunction devices show both optical and electrical advantages (based on lab-scale tests). The champion BF Cu-plated device shows a front-side efficiency of 22.1% and a bifaciality factor of 0.99.

The authors inadvertently misreported the order of magnitude of the TCO deposition pressure, for which all “10−3 Pa” should be intended as “Pa”. The authors regret for the mistake. These errors do not affect the conclusions of the work. The following errors needs to be corrected in the article. Page 45587. EXPERIMENTAL SECTION, 2.1. “2.50 × 10−3 Pa” and “2.20 × 10−3 Pa” should be “2.50 Pa” and “2.20 Pa”, respectively. Page 45588. RESULTS AND DISCUSSION, 3.1. All the “... × 10−5 Pa” should be “... × 10−2 Pa”. The physical unit of the “10−5 Pa” in the x-axis of Figure 2 should also be “10−2 Pa”. The correct Figure 2 appears below: (Figure presented).

Low parasitic absorption and high conductivity enable (n)-type hydrogenated nanocrystalline silicon [(n)nc-Si:H], eventually alloyed with oxygen [(n)nc-SiO_x:H], to be deployed as window layer in high-efficiency silicon heterojunction (SHJ) solar cells. Besides the appropriate opto-electrical properties of these nanocrystalline films, reduction of their thickness is sought for minimizing parasitic absorption losses. Many strategies proposed so far reveal practical limits of the minimum (n)-layer thickness that we address and overcome in this manuscript. We demonstrated the successful application of an ultra-thin layer of only 3-nm-thick based on (n)nc-Si:H PECVD plasma growth conditions without the use of additional contact or buffer layers. For simplicity, we still name (n)nc-Si:H this ultra-thin layer and the solar cell endowed with it delivers a certified efficiency η of 22.20%. This cell shows a 0.61 mA/cm² overall J_SC gain over the (n)a-Si:H counterpart mainly owing to the higher transparency of (n)nc-Si:H, while maintaining comparable V_OC > 714 mV and FF > 80%. Our optimized (n)nc-Si:H layer yields low absorption losses that are commonly measured for (n)nc-SiO_x:H films. In this way, we are able to avoid the detrimental effect that oxygen incorporation has on the electrical parameters of these functional layers. Further, by applying a MgF₂/ITO double-layer anti-reflection coating, a cell with 3-nm-thick (n)nc-Si:H exhibits a J_SC,EQE up to 40.0 mA/cm². By means of EDX elemental mapping, we additionally identified the (n)nc-Si:H/ITO interface as critical for electron transport due to unexpected oxidation. To avoid this interfacial oxidation, insertion of a 2-nm-thick (n)a-Si:H on the 3-nm-thick (n)nc-Si:H contributes to FF gains of 1.4%_abs. (FF increased from 78.6% to 80.0%), and showing further room for improvements.

Low activation energy (E_a) and wide bandgap (E_g) are essential for (p)-contacts to achieve effective hole collection in silicon heterojunction (SHJ) solar cells. In this work, we study Plasma-Enhanced Chemical Vapor Deposition p-type hydrogenated nanocrystalline silicon oxide, (p)nc-SiO_x:H, combined with (p)nc-Si:H as (p)-contact in front/back-contacted SHJ solar cells. We firstly determine the effect of a plasma treatment at the (i)a-Si:H/(p)-contact interface on the thickness-dependent E_a of (p)-contacts. Notably, when the (p)nc-Si:H layer is thinner than 20 nm, the E_a decreases by applying a hydrogen plasma treatment and a very-high-frequency (i)nc-Si:H treatment. Such an interface treatment also significantly reduces the contact resistivity of the (p)-contact stacks (ρ_c,p), resulting in an improvement of 6.1%_abs in fill factor (FF) of the completed cells. Thinning down the (i)a-Si:H passivating layer to 5 nm leads to a low ρ_c,p (144 mΩ⋅cm²) for (p)-contact stacks. Interestingly, we observe an increment of FF from 72.9% to 78.3% by using (p)nc-SiO_x:H layers featuring larger differences between their optical gap (E₀₄) and E_a, which tend to enhance the built-in potential at the c-Si/(i)a-Si:H interface. Furthermore, we observe clear impacts on ρ_c,p, open-circuit voltage, and FF by optimizing the thicknesses of (p)-contact that influence its E_a. In front junction cells, the vertical and lateral collection of holes is affected by ρ_c,p of (p)-contact stacks. This observation is also supported by TCAD simulations which reveal different components of lateral contributions. Lastly, we obtain both front and rear junction cells with certified FF well-above 80% and the best efficiency of 22.47%.

The window layers limit the performance of silicon heterojunction (SHJ) solar cells with front and back contacts. Here, we optimized tungsten-doped indium oxide (IWO) film deposited by radio frequency magnetron sputtering at room temperature. The opto-electrical properties of the IWO were manipulated when deposited on top of thin-film silicon layers. The optimal IWO on glass shows carrier density and mobility of 2.1 × 1020 cm−3 and 34 cm2 V−1s−1, respectively, which were tuned to 2.0 × 1020 cm−3 and 47 cm2 V−1s−1, as well as 1.9 × 1020 cm−3 and 42 cm2 V−1s−1, after treated on i/n/glass and i/p/glass substrates, respectively. Using the more realistic TCO data that were obtained on thin-film silicon stacks, optical simulation indicates a promising visible-to-near-infrared optical response in IWO-based SHJ device structure, which was demonstrated in fabricated devices. Additionally, by adding an additional magnesium fluoride layer on device, the champion IWO-based SHJ device showed an active area cell efficiency of 22.92%, which is an absolute 0.98% efficiency gain compared to the ITO counterpart, mainly due to its current gain of 1.48 mA/cm2.

The authors inadvertently misreported the order of magnitude of the TCO deposition pressure, for which all “10-3 Pa” should be intended as “Pa”. The following errors appear in the article. P8607. EXPERIMENTAL SECTION, 2.1. “2.50 × 10-3 Pa”, “1.6 × 10-5 Pa”, and “2.20 × 10-3 Pa” should be read as “2.50 Pa”, “1.6 × 10-2 Pa”, and “2.20 Pa”, respectively. These errors do not affect the “RESULTS AND DISCUSSION” or “CONCLUSIONS” of this article.

In high-efficiency silicon solar cells featuring carrier-selective passivating contacts based on ultrathin SiOx/poly-Si, the appropriate implementation of transparent conductive oxide (TCO) layers is of vital importance. Considerable deterioration in passivation quality occurs for thin poly-Si-based devices owing to the sputtering damage during TCO deposition. Curing treatment at temperatures above 350 °C can recover such degradation, whereas the opto-electrical properties of the TCO are affected as well, and the carrier transport at the poly-Si/TCO contact is widely reported to degrade severely in such a procedure. Here, we propose straightforward approaches, post-deposition annealing at 400 °C in nitrogen, hydrogen, or air ambience, are proposed to tailor material properties of high-mobility hydrogenated fluorine-doped indium oxide (IFO:H) film. Structural, morphological, and opto-electrical properties of the IFO:H films are investigated as well as their inherent electron scattering and doping mechanisms. Hydrogen annealing treatment proves to be the most promising strategy. The resulting layer exhibits both optimal opto-electrical properties (carrier density = 1.5 × 1020 cm-3, electron mobility = 108 cm2 V-1 s-1, and resistivity = 3.9 × 10-4 ω cm) and remarkably low contact resistivities (∼20 mω cm2 for both n- and p-contacts) in poly-Si solar cells. Even though the presented cells are limited by the metallization step, the obtained IFO:H-base solar cell show an efficiency improvement from 20.1 to 20.6% after specific hydrogen treatment, demonstrating the potential of material manipulation and contact engineering strategy in high-efficiency photovoltaic devices endowed with TCOs.