Erratum
High-Mobility Hydrogenated Fluorine-Doped Indium Oxide Film for Passivating Contacts c-Si Solar Cells (ACS Appl. Mater. Interfaces (2019) 11:49 (45586−45595) DOI: 10.1021/acsami.9b14709)
Can Han (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Luana Mazzarella (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Yifeng Zhao (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Guangtao Yang (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Paul Procel (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Martijn Tijssen (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Ana Montes
Olindo Isabella (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Miro Zeman (TU Delft - Electrical Engineering, Mathematics and Computer Science)
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Abstract
The authors inadvertently misreported the order of magnitude of the TCO deposition pressure, for which all “10−3 Pa” should be intended as “Pa”. The authors regret for the mistake. These errors do not affect the conclusions of the work. The following errors needs to be corrected in the article. Page 45587. EXPERIMENTAL SECTION, 2.1. “2.50 × 10−3 Pa” and “2.20 × 10−3 Pa” should be “2.50 Pa” and “2.20 Pa”, respectively. Page 45588. RESULTS AND DISCUSSION, 3.1. All the “... × 10−5 Pa” should be “... × 10−2 Pa”. The physical unit of the “10−5 Pa” in the x-axis of Figure 2 should also be “10−2 Pa”. The correct Figure 2 appears below: (Figure presented).