This thesis explores the growth, fabrication and measurement of freestanding complex oxide membranes. Complex oxides such as SrRuO3 and NdNiO3 are fabricated into a freestanding membrane form, with their numerous intrinsic properties and phenomena characterised and investigated. New techniques describing solutions to the current fabrication hurdles of freestanding complex oxide membranes is discussed, along with the comparison of SrRuO3 and NdNiO3 freestanding membranes and their epitaxial counterparts.

The epitaxial growth of complex oxides enables the production of high-quality films, yet substrate choice is restricted to certain symmetry and lattice parameters, thereby limiting the technological applications of epitaxial oxides. In comparison, the development of free-standing oxide membranes gives opportunities to create novel heterostructures by nonepitaxial stacking of membranes, opening new possibilities for materials design. Here, we introduce a method for writing, with atomic precision, ionically bonded crystalline materials across the gap between an oxide membrane and a carrier substrate. The process involves a thermal pretreatment, followed by localized exposure to the raster scan of a scanning transmission electron microscopy (STEM) beam. STEM imaging and electron energy-loss spectroscopy show that we achieve atomically sharp interface reconstructions between a 30-nm-thick SrTiO3 membrane and a niobium-doped SrTiO3(001)-oriented carrier substrate. These findings indicate new strategies for fabricating synthetic heterostructures with novel structural and electronic properties.