Multi-Scale modeling of chemical vapor deposition processes for thin film technology

Zinc deposition experiments for validation of direct numerical Monte Carlo calculations of rarefied internal gas flows

Numerical simulations of rarefied gas flows in thin film processes

A general correction to surface reaction models based on reactive sticking coefficients

Zinc deposition experiments for validation of direct numerical Monte Carlo calculations of rarefied internal gas flows

A critical evaluation of surface reaction models based on reactive sticking coefficients

The effect of HVPE reactor geometry on GaN growth rate - experiments versus simulations

Heat transfer in very low pressure stagnation flow CVD reactors

Rapportage 2002 project 'Chemically reacting rarefied gas flow'. (Report to TNO-TPD)