n-Channel MOSFETs fabricated on SiGe dots for strain-enhanced mobility

Journal Article (2010)
Authors

V. Jovanovic (TU Delft - Electronic Components, Technology and Materials)

C Biasotto (TU Delft - Electronic Components, Technology and Materials)

L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)

J Moers (External organisation)

D Gruetzmacher (External organisation)

J Gerharz (External organisation)

G Mussler (External organisation)

J. van der Cingel (TU Delft - Electronic Components, Technology and Materials)

Jing Guo Zhang (TU Delft - Electronic Components, Technology and Materials)

G. Bauer (External organisation)

OG Schmidt (External organisation)

L Miglio (External organisation)

Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://doi.org/10.1109/LED.2010.2058995
More Info
expand_more
Publication Year
2010
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
10
Volume number
31
Pages (from-to)
1083-1085
DOI:
https://doi.org/10.1109/LED.2010.2058995

No files available

Metadata only record. There are no files for this record.