Atomic Layer Deposition of ZnO on InP Quantum Dot Films for Charge Separation, Stabilization, and Solar Cell Formation
Ryan W. Crisp (TU Delft - ChemE/Opto-electronic Materials)
Fatemeh S.M. Hashemi
Jordi Alkemade (TU Delft - ChemE/Product and Process Engineering)
Nicholas Kirkwood (TU Delft - ChemE/Opto-electronic Materials)
Gianluca Grimaldi (TU Delft - ChemE/Opto-electronic Materials)
Sachin Kinge (Toyota Motor Europe)
Laurens D.A. Siebbeles (TU Delft - ChemE/Opto-electronic Materials)
J. Ruud van Ommen (TU Delft - ChemE/Product and Process Engineering)
Arjan J. Houtepen (TU Delft - ChemE/Opto-electronic Materials)
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Abstract
To improve the stability and carrier mobility of quantum dot (QD) optoelectronic devices, encapsulation or pore infilling processes are advantageous. Atomic layer deposition (ALD) is an ideal technique to infill and overcoat QD films, as it provides excellent control over film growth at the sub-nanometer scale and results in conformal coatings with mild processing conditions. Different thicknesses of crystalline ZnO films deposited on InP QD films are studied with spectrophotometry and time-resolved microwave conductivity measurements. High carrier mobilities of 4 cm2 (V s)−1 and charge separation between the QDs and ZnO are observed. Furthermore, the results confirm that the stability of QD thin films is strongly improved when the inorganic ALD coating is applied. Finally, proof-of-concept photovoltaic devices of InP QD films are demonstrated with an ALD-grown ZnO electron extraction layer.
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