Capping layer on thin Si film for ¿-Czochralski process with excimer laser crystallization
Journal Article
(2006)
Author(s)
R Vikas (External organisation)
R. Ishihara (TU Delft - Electronic Components, Technology and Materials)
Y Hiroshima (External organisation)
D Abe (External organisation)
S Inoue (External organisation)
T Shimoda (External organisation)
JW Metselaar (TU Delft - Electronic Components, Technology and Materials)
C.I.M. Beenakker (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:126a279e-9a43-4ed7-859b-b2e80879fe08
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Publication Year
2006
Research Group
Electronic Components, Technology and Materials
Volume number
45
Pages (from-to)
4340-4343
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