High performance single grain SI TFTs inside a location-controlled grain by µ-Czochralski process with capping-layer
Conference Paper
(2005)
Author(s)
R Vikas (External organisation)
R. Ishihara (TU Delft - Electronic Components, Technology and Materials)
Y Hiroshima (External organisation)
D Abe (External organisation)
S Inoue (External organisation)
T Shimoda (External organisation)
JW Metselaar (TU Delft - Electronic Components, Technology and Materials)
C.I.M. Beenakker (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:1864fa65-0f93-4187-982b-93fc6dd6c0b3
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Publication Year
2005
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1-4
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