Electrical property of coincidence site lattice grain boundary in location-controlled Si island by excimer-laser crystallization

Ishihara, R.; He, M; Rana, V; Hiroshima, Y; Inoue, S; Shimoda, T; Metselaar, JW; Beenakker, C. W J

Electrical property of coincidence site lattice grain boundary in location-controlled Si island by excimer-laser crystallization

Journal article (2005)

Authors

R. Ishihara Electronic Components, Technology and Materials

M He Electronic Components, Technology and Materials

V Rana Electronic Components, Technology and Materials

Y Hiroshima External organisation

S Inoue External organisation

T Shimoda External organisation

JW Metselaar Electronic Components, Technology and Materials

C. W J Beenakker Electronic Components, Technology and Materials

Research Group

Electronic Components, Technology and Materials

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2005

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Research Group

Electronic Components, Technology and Materials

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