Side Gate Tunable Josephson Junctions at the LaAlO3/SrTiO3 Interface
A.M. RinconVieiraLugarinhoMonteiro (TU Delft - QN/Caviglia Lab, Kavli institute of nanoscience Delft)
Dirk J. Groenendijk (TU Delft - QN/Caviglia Lab, Kavli institute of nanoscience Delft)
N. Manca (TU Delft - QN/Caviglia Lab, Kavli institute of nanoscience Delft)
E Mulazimoglu (Kavli institute of nanoscience Delft, TU Delft - QN/Caviglia Lab)
S. Goswami (TU Delft - QRD/Kouwenhoven Lab, Kavli institute of nanoscience Delft)
Yaroslav M. Blanter (Kavli institute of nanoscience Delft, TU Delft - QN/Blanter Group)
Lieven M K Vandersypen (TU Delft - QN/Vandersypen Lab, Kavli institute of nanoscience Delft)
Andrea D. Caviglia (Kavli institute of nanoscience Delft, TU Delft - QN/Caviglia Lab)
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Abstract
Novel physical phenomena arising at the interface of complex oxide heterostructures offer exciting opportunities for the development of future electronic devices. Using the prototypical LaAlO3/SrTiO3 interface as a model system, we employ a single-step lithographic process to realize gate-tunable Josephson junctions through a combination of lateral confinement and local side gating. The action of the side gates is found to be comparable to that of a local back gate, constituting a robust and efficient way to control the properties of the interface at the nanoscale. We demonstrate that the side gates enable reliable tuning of both the normal-state resistance and the critical (Josephson) current of the constrictions. The conductance and Josephson current show mesoscopic fluctuations as a function of the applied side gate voltage, and the analysis of their amplitude enables the extraction of the phase coherence and thermal lengths. Finally, we realize a superconducting quantum interference device in which the critical currents of each of the constriction-type Josephson junctions can be controlled independently via the side gates.