Single step cryogenic SF6/O2 plasma etching process for the development of inertial devices
Conference Paper
(2002)
Author(s)
G Craciun (TU Delft - Electronic Instrumentation)
H Yang (TU Delft - Electronic Instrumentation)
H.W. van Zeijl (TU Delft - Electronic Components, Technology and Materials)
L Pakula (TU Delft - Electronic Instrumentation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Pim J. French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
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https://resolver.tudelft.nl/uuid:8e2f4be1-78c5-45c5-8b74-b4a2c264587e
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Publication Year
2002
Research Group
Electronic Instrumentation
Pages (from-to)
612-614
ISBN (print)
90-73461-33-2
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