Current dependence of reversible electromigration induced resistance changes in short Al lines and interpretation of irreversible effects
Conference Paper
(1996)
Author(s)
A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
MJC van de Homberg (TU Delft - QN/Fysics of NanoElectronics)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
JR Kraayeveld (External organisation)
AWJ Willemsen (External organisation)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
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https://resolver.tudelft.nl/uuid:95f2aa6b-f281-42b1-809d-50e7016bf360
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Publication Year
1996
Research Group
QN/Fysics of NanoElectronics
Pages (from-to)
121-126
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