Low-complexity full-melt laser-anneal process for fabrication of low-leakage implanted ultrashallow junctions
Journal Article
(2011)
Authors
C Biasotto (TU Delft - Electronic Components, Technology and Materials)
V Gonda (Old - EWI Sect. ECTM)
Lis Nanver (TU Delft - Electronic Components, Technology and Materials)
T.L.M. Scholtes (TU Delft - Electronic Components, Technology and Materials)
J van der Cingel (TU Delft - Electronic Components, Technology and Materials)
D Vidal (External organisation)
V Jovanovic (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://doi.org/10.1007/s11664-011-1734-6
TU Delft Repository resolver:
https://resolver.tudelft.nl/ad16f9c1-f9a0-466b-b29c-a655e44b9d43
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Publication Year
2011
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
11
Volume number
40
Pages (from-to)
2187-2196
DOI:
https://doi.org/10.1007/s11664-011-1734-6
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