Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma

Smets, AHM; Petit, AMHN; Nadazdy, V; Kessels, Wilhelmus M.M.; van Swaaij, René A.C.M.M.; van de Sanden, MCM

Improvement of material properties by employing external RF substrate bias during a-Si:H deposition by a remote expending thermal plasma

Conference paper (2005)

Authors

AHM Smets External organisation

AMHN Petit Electronic Components, Technology and Materials

V Nadazdy Electronic Components, Technology and Materials

Wilhelmus M.M. Kessels External organisation

René A.C.M.M. van Swaaij Electronic Components, Technology and Materials

MCM van de Sanden External organisation

Research Group

Electronic Components, Technology and Materials

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Published Date

2005

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Research Group

Electronic Components, Technology and Materials

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