Single-crystalline Si thin film transistors with electron cyclotron resonance plasma enhanced chemical vapor deposited gate SiO2

R. Ishihara (TU Delft - Electronic Components, Technology and Materials)

BD van Dijk (TU Delft - Electronic Components, Technology and Materials)

PC van der Wilt (TU Delft - Electronic Components, Technology and Materials)

JW Metselaar (TU Delft - Electronic Components, Technology and Materials)

CIM Beenakker (TU Delft - Electronic Components, Technology and Materials)

Y Hiroshima (External organisation)

D Abe (External organisation)

S Higashi (External organisation)

S Inoue (External organisation)

T Shimoda (External organisation)