SRAM Physical Unclonable Functions (PUFs) serve as security primitives and can be used to generate random and unique identifiers, which makes their reliability crucial. The reliability is affected by aging and in particular Bias Temperature Instability (BTI), which in turn affects the PUF responses over time typically measured by the Hamming distance (HD). In this work, we model the BTI impact on SRAM PUF reliability for 14 nm FinFET technology and evaluate the reliability of SRAM PUFs using both simulation and silicon measurements. Additionally, we explore the effectiveness of an anti-aging technique on SRAM PUF reliability. Our simulation model and results (which include process variation and circuit noise) are validated with silicon measurements. From them we conclude the following: 1) there exists a direct correlation between BTI and the Hamming distance of an SRAM PUF, where its reliability decreases with 6% over a 6-month period due to aging, and 2) applying anti-aging patterns improves the Hamming distance and hence the reliability with 3% over a 6-month period. ... Read more

SRAM Physical Unclonable Functions (PUFs) are one of the popular forms of PUFs that can be used to generate unique identifiers and randomness for security purposes. Hence, their resilience to attacks is crucial. The probability of attacks increases when the SRAM PUF start-up values follow a predictable pattern which we refer to as bias. In this paper, we investigate the parameters impacting the SRAM PUF bias of advanced FinFET SRAM designs. In particular, we analyze the bias with respect to temperature, mismatches in the power supply network, and ramp-up time. We also consider process variation, circuit noise, and SRAM layout in our analysis. Our simulations results match with the silicon measurements. From the experiments we conclude that (i) the SRAM layout and in particular the power supply network can lead to a bias, (ii) this bias increases with temperature, and (iii) this bias increases when the supply ramp-up time decreases. ... Read more

SRAM Physical Unclonable Functions (PUFs) are among other things today commercially used for secure primitives such as key generation and authentication. The quality of the PUFs and hence the security primitives, depends on intrinsic variations which are technology dependent. Therefore, to sustain the commercial usage of PUFs for cutting-edge technologies, it is important to properly model and evaluate their reliability. In this work, we evaluate the SRAM PUF reliability using within class Hamming distance (WCHD) for 16nm, 14nm, and 7nm using simulations and silicon validation for both low-power and high-performance designs. The results show that our simulation models and expectations match with the silicon measurements. From the experiments, we conclude the following: (1) SRAM PUF is reliable in advanced FinFET technology nodes, i.e., the noise is low in 16nm, 14nm, and 7nm, (2) temperature variations have a marginal impact on the reliability, and (3) both low-power and high-performance SRAMs can be used as a PUF without excessive need of error correcting codes (ECCs). ... Read more

In this paper, we develop an analytical PUF model based on a compact FinFET transistor model that calculates the PUF stability (i.e. PUF static noise margin (PSNM)) for FinFET based SRAMs. The model enables a quick design space exploration and may be used to identify critical parameters that affect the PSNM. The analytical model is validated with SPICE simulations. In our experiments, we analyze the impact of process variation, technology, and temperature on the PSNM. The results show that the analytical model matches very well with the simulation model. From the experiments we conclude the following: (1) nFET variations have a larger impact on the PSNM than pFET (1.5% higher PSNM in nFET variations than pFET variations at 25°C), (2) high performance SRAM cells are more skewed (1.3% higher PSNM) (3) the reproducibility increases with smaller technology nodes (0.8% PSNM increase from 20 to 14 nm) (4) increasing the temperature from-10°C to 120°C leads to a PSNM change of approximately 1.0% for an extreme nFET channel length. ... Read more