Resistance Changes Induced by the Formation of a Single Void/Hillock During Electromigration
Conference Paper
(1998)
Author(s)
A.H. Verbruggen (TU Delft - QN/Fysics of NanoElectronics)
MJC van de Homberg (TU Delft - QN/Fysics of NanoElectronics)
LC Jacobs (External organisation)
AJ Kalkman (TU Delft - QN/Fysics of NanoElectronics)
JR Kraayeveld (External organisation)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:6e10ebec-a0fc-4805-81f7-51d582629328
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Publication Year
1998
Research Group
QN/Fysics of NanoElectronics
Pages (from-to)
135-146
ISBN (print)
1563966824
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