Resistance Changes Induced by the Formation of a Single Void/Hillock During Electromigration

Conference paper (1998)

Authors

A.H. Verbruggen QN/Fysics of NanoElectronics
MJC van de Homberg QN/Fysics of NanoElectronics
LC Jacobs External organisation
AJ Kalkman QN/Fysics of NanoElectronics
JR Kraayeveld External organisation
S Radelaar OLD Metals Processing, Microstructures and Properties
Research Group
QN/Fysics of NanoElectronics
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Published Date

1998

Language

Undefined/Unknown

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Research Group

QN/Fysics of NanoElectronics